Stoichiometric LPCVD Nitride – 4,000Å
|Film Type||Stoichiometric LPCVD Nitride|
|Film Thickness||4,000Å +/- 5%|
|Lot Size||25 wafers|
Product ID: PRD1018
|Substrate Thickness:||525 +/-25μm|
|Surface Condition:||Single Side Polished|
|Film Thickness:||4,000Å +/- 5%|
|Film Type:||Stoichiometric LPCVD Nitride|
|Lot Size:||25 wafers|
This product consists of 25 pieces of silicon wafers with Stoichiometric LPCVD Nitride - 4,000Å.
Stoichiometric LPCVD Nitride deposited on silicon wafers. Processed in our class 100 cleanroom to ensure a premiμm quality film. This is a furnace process so both surfaces of the wafers will have Nitride. Stoichiometric LPCVD Nitride film stress =>800 MPa Tensile and Refractive Index 2.00 +/- 0.05nm @ 632.8nm. Product to ship with film Certificate of Conformance. Need something different? Please email email@example.com for a quote.
2 in stock
For Orders of more than four, please request a quote to receive a volume pricing discount.
All Sales are Final. RVM Terms and Conditions Apply Shipping PP&A. Lead Time 1 week.