In MEMS and biomedical device fabrication, photolithography requirements may vary widely and that’s where we come in.
Whether your process demands a spray coat or spin coat on various substrates, our foundry checks all the boxes.
Etching is the chemical removal of a thin film material during device processing. With field-proven experience, we provide etch variations to meet your requirements.
Metal lift-off is an alternative process when etch is not a solution. We developed a specialized bilayer resist process that improves film adhesion and results in clean high-quality lift-off.
We use thermal oxide as the primary passivation layer which allows us to build MEMS with the more temperature-friendly silicon.
Silicon nitride is a highly versatile film that we use to build MEMS devices or as a tool for defining active regions during field oxidation.
Metal thin films are essential components in device-building. We offer the flexibility to ensure we meet your specific requirements.
Our LPCVD polysilicon films enable control over crystallinity, uniformity, grain-size and film stress—making them versatile for MOS and MEMS applications
Silicon Wafer
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