Wet Thermal Oxide – 2,000Å / Stoichiometric LPCVD Nitride – 2,000Å
|Film Type||Wet Thermal Oxide / Stoichiometric LPCVD Nitride|
|Film Thickness||WTO - 2,000Å / SiN - 2,000Å +/- 5%|
|Lot Size||25 wafers|
Product ID: PRD1027
|Substrate Thickness:||525 +/-25μm|
|Surface Condition:||Double Side Polished|
|Film Thickness:||WTO - 2,000Å / SiN - 2,000Å +/- 5%|
|Film Type:||Wet Thermal Oxide / Stoichiometric LPCVD Nitride|
|Lot Size:||25 wafers|
This product consists of 25 pieces of silicon wafers with Wet Thermal Oxide - 2,000Å / Stoichiometric LPCVD Nitride - 2,000Å. It is a 2-layer film stack.
2-layer film stack. Wet Thermal Oxide is grown followed by Stoichiomtetric LPCVD Nitride deposition. Substrates are cleaned prior to processing in our class 100 cleanroom to ensure a premiμm quality film. This is a furnace process so both surfaces of the wafers will have oxide. Stoichiometric LPCVD Nitride film stress =>800 MPa Tensile and Refractive Index 2.00 +/- 0.05 @ 632.8nm. Product to ship with film Certificate of Conformance. Need something different? Please email firstname.lastname@example.org for a quote.
4 in stock
For Orders of more than four, please request a quote to receive a volume pricing discount.
All Sales are Final. RVM Terms and Conditions Apply Shipping PP&A. Lead Time 1 week.