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LPCVD Undoped Polysilicon in MOS and MEMS Applications
The degree of crystallinity and uniformity can be controlled by optimizing process pressure and temperature parameters. The manipulation of process temperature can also be used to control grain-size and film stress.
Rogue Valley Microdevices offers a variety of Polysilicon films by tailoring deposition conditions. We offer LPCVD Polysilicon films in standard or small (fine) grain film composition, along with different film stress levels ideal for many MEMS-specific applications.