Wet Thermal Oxide – 3μm

Parameters

Film TypeWet Thermal Oxide
Film Thickness3μm +/- 5%
Lot Size25 wafers

Product ID: PRD1014

MaterialSilicon
Diameter100mm
Type/DopantP/Boron
Orientation<100>
Resistivity>1 ohm-cm
Substrate Thickness525 +/-25μm
Surface ConditionSingle Side Polished
Flat/Notch2 Semi-std
Film Thickness3μm +/- 5%
Film TypeWet Thermal Oxide
Lot Size25 wafers

Product ID: PRD1504

MaterialSilicon
Diameter150mm
Type/DopantP/Boron
Orientation<100>
Resistivity>1 ohm-cm
Substrate Thickness675 +/-25μm
Surface ConditionSingle Side Polished
Flat/Notch1 Semi-std
Film Thickness3μm +/- 5%
Film TypeWet Thermal Oxide
Lot Size25 wafers
This product consists of 25 pieces of silicon wafers with Wet Thermal Oxide - 3μm.
Wet Thermal Oxide grown on silicon wafers. Substrates are cleaned prior to processing in our class 100 cleanroom to ensure a premiμm quality film. This is a furnace process so both surfaces of the wafers will have oxide. Product to ship with film Certificate of Conformance. Need something different? Please email sales@roguevalleymicro.com for a quote.
2 in stock2 in stock
$1,608.75$1,964.75
per lot

For Orders of more than four, please request a quote to receive a volume pricing discount.

All Sales are Final. RVM Terms and Conditions Apply Shipping PP&A. Lead Time 1 week.