Wet Thermal Oxide – 10um
Parameters
| Film Type | Wet Thermal Oxide |
| Film Thickness | 10um +/-5% |
| Lot Size | 25 wafers |
Product ID: PRD1028
| Material: | Silicon |
| Diameter: | 100mm |
| Type/Dopant: | P/Boron |
| Orientation: | <100> |
| Resistivity: | >1 ohm-cm |
| Substrate Thickness: | 525 +/-25μm |
| Surface Condition: | Single Side Polished |
| Flat/Notch: | 2 Semi-std |
| Film Thickness: | 10um +/-5% |
| Film Type: | Wet Thermal Oxide |
| Lot Size: | 25 wafers |
This product consists of 25 silicon wafer with 10um Wet Thermal Oxide.
Wet Thermal Oxide grown on silicon wafers. Substrates are cleaned prior to processing in our class 100 cleanroom to ensure a premiμm quality film. This is a furnace process so both surfaces of the wafers will have oxide. Product to ship with film Certificate of Conformance. Need something different? Please email sales@roguevalleymicro.com for a quote.
2 in stock
$6,464.25
per lotFor Orders of more than four, please request a quote to receive a volume pricing discount.
All Sales are Final. RVM Terms and Conditions Apply Shipping PP&A. Lead Time 1 week.
