![](https://roguevalleymicrodevices.com/wp-content/uploads/2022/07/Lithographymicrodevices-128.jpg)
Photolithography
When it comes to MEMS, biomedical devices, and optical sensors, photolithography isn’t one-size-fits-all. Requirements may vary widely, depending on the design and function of your device. We have the capabilities to support you.
![](https://roguevalleymicrodevices.com/wp-content/uploads/2022/08/photolithography.jpg)
MEMS, biomedical devices, and optical devices often require smaller geometries and tighter line widths than a contact aligner can achieve. That’s why we maintain both I-line stepper lithography equipment and contact lithography equipment with front-to-back alignment capability. Our front-to-back contact aligner provides patterning alignment on both the back and front sides of the substrate for your MEMS and biomedical devices.
Contact and Proximity Alignment
- Substrate: 100mm, 150mm, 200mm
- ≥5µm Feature Size
- Front-to-Back Alignment Capability
Projection Alignment (Stepper)
- Substrate: 150mm
- ≥1µm Feature Size
- 5x Reduction Stepper
- Field Step Size 15mmx15mm