Low Stress LPCVD Nitride – 1μm
|Film Type||Low Stress LPCVD Nitride|
|Film Thickness||1μm +/- 5%|
|Lot Size||25 wafers|
Product ID: PRD1026
|Substrate Thickness:||525 +/-25μm|
|Surface Condition:||Single Side Polished|
|Film Thickness:||1μm +/- 5%|
|Film Type:||Low Stress LPCVD Nitride|
|Lot Size:||25 wafers|
This product consists of 25 pieces of silicon wafers with Low Stress LPCVD Nitride - 1μm.
Low Stress LPCVD Nitride deposited on silicon wafers. Processed in our class 100 cleanroom to ensure a premiμm quality film. This is a furnace process so both surfaces of the wafers will have Nitride. Low Stress LPCVD Nitride film stress <250MPa Tensile and Refractive Index 2.20 +/- 0.05nm @ 632.8nm. Product to ship with film Certificate of Conformance. Need something different? Please email email@example.com for a quote.
2 in stock
For Orders of more than four, please request a quote to receive a volume pricing discount.
All Sales are Final. RVM Terms and Conditions Apply Shipping PP&A. Lead Time 1 week.