Silicon Nitride
Silicon nitride is a highly versatile film. You can use it to build MEMS devices or as a tool for defining active regions during field oxidation. As a tensile stress film, you can use nitride as a passivation layer or help balance film stress within a stack.
Silicon Nitride Varieties
Nitride is one of our most popular films. It’s a great choice for building membranes, cantilever beams, and other mechanical structures.
- Stoichiometric LPCVD Nitride
- Low-Stress LPCVD Nitride
- Super Low-Stress LPCVD Nitride
- Targeted Film Stress LPCVD Nitride
- PECVD Nitride
- Low Temp PECVD Nitride
- Low-Stress PECVD Nitride
- PECVD Silicon Oxynitride
LPCVD Nitride
We offer several variations to meet your needs: stoichiometric LPCVD nitride is effective as an insulator, and low-stress LPCVD nitride is effective as a hard mask during KOH etching. Whichever nitride film you choose, you can count on robust high-quality film. We deliver engineered low stress and super low-stress LPCVD nitride for deposition up to 2µm in thickness without cracking or peeling. We’re able to process substrate diameter: 50.8mm, 76.2mm, 100mm, 125mm, 150mm, 200mm.
- Stoichiometric Film Stress => 800 MPa Tensile
- Low-Stress Film Stress <250 MPa Tensile
- Super Low-Stress Film Stress <100 MPa Tensile
Need to customize your film stress?
Request a quote as our nitride process uses specific gas ratios to produce the film properties that are in high demand. Using our uniquely stable nitride process as a foundation, we’ll deliver a targeted film stress nitride film to fit your exact application.
Our engineers have decades of experience in developing and optimizing our nitride films.
PECVD Nitride
Widely used in MEMS and semiconductor processing, PECVD nitride is a tensile stress film that you can use as a passivation layer or help balance film stress within a stack. If you need a nitride film that stays within lower temperature ranges (200C-375C), our PECVD nitride is a superb option. Film thickness up to 2um on on substrate diameters: 50.8mm, 76.2mm, 100mm, 125mm, 150mm, 200mm, 300mm.
- PECVD Nitride
- Low Temp PECVD Nitride
- Low-Stress PECVD Nitride <250 MPa Tensile
- Low Temp Low-Stress PECVD Nitride
PECVD Silicon Oxynitride (SiON)
PECVD SiON is a mechanically stable film with optical properties that make it ideal for integrated circuits. It features a refractive index or film stress in a made-to-order recipe that meets your process requirements. Film thickness up to 4µm on on substrate diameters: 50.8mm, 76.2mm, 100mm, 125mm, 150mm, 200mm, 300mm.
- Targeted Refractive Index SiON
- Targeted Film Stress SiON
- Low Temp SiON <350°C