Our PECVD oxide is a single-sided film that has been optimized for wafers requiring minimal thermal processing and is often used during the semiconductor manufacturing process to form intra-metal dielectric stacks.
PECVD oxide is also used in MEMS and surface micro-machining processes. Our PECVD oxide films offer you greater process flexibility and can be combined with many of our other films including PECVD nitride LPCVD nitride, and PVD metals.
