This product consists of medium resistivity Silicon wafers coated with 3um of our ultra-pure Wet thermal Oxide. Thick thermal oxide is a common material used in the fabrication of Wave guide technologies and Silicon on Insulator wafers. All orders are sent with a Certificate of Conformance containing wafer specifications and film thickness data.
Wet Thermal Oxidation Parameters |
|
| Thickness | 28,500Å – 31,500Å |
| Thickness Tolerance | 30,000Å +/-5% |
| Sides Pressed | Both |
| Refractive Index | 1.456 +/-0.02 @ 632.8nm |
| Film Stress | -320MPa +/-50MPa (Compressive) |
| Wafer Thickness | Std. Thickness |
| Wafer Material | Silicon |
| Temperature | 900C° – 1050C° |
| Gasses | Oxygen |
| Equipment | Horizontal Furnace |
