PRD1014 – 100mm Silicon Wafers 30,000A Wet Thermal Oxide


Product ID: PRD1014
Substrate: Silicon Wafers
Diameter: 100mm
Type/Dopant: P/Boron
Orientation: <100>
Resistivity: 1-20 Ohm-cm
Thickness: 525 +/- 25um
Front Side: Polished
Back Side: Etched
Film: 30,000A +/- 5% Wet Thermal Oxide

All Sales are Final.  RVM Terms and Conditions Apply
Shipping PP&A.  Lead time 1 week

1 in stock (can be backordered)

SKU: PRD1014 Categories: ,


This product consists of medium resistivity Silicon wafers coated with 3um of our ultra-pure Wet Thermal Oxide.  Thick thermal oxide is a common material used in the fabrication of Wave guide technologies and Silicon on Insulator wafers.  All orders are sent with a Certificate of Conformance containing wafer specifications and film thickness data.

100mm Silicon Wafers 30,000A Wet Thermal Oxidation Parameters

Thickness 28,500Å – 31,500Å
Thickness Tolerance 30,000Å +/-5%
Sides Pressed Both
Refractive Index 1.456 +/-0.02 @ 632.8nm
Film Stress -320MPa +/-50MPa (Compressive)
Wafer Thickness Std. Thickness
Wafer Material Silicon
Temperature 900C° – 1050C°
Gasses Oxygen
Equipment Horizontal Furnace

Additional information