PRD1000 – 100mm Silicon Wafers 1,000A Wet Thermal Oxide

$950.00

Product ID: PRD1000
Substrate: Silicon Wafers
Diameter: 100mm
Type/Dopant: P/Boron
Orientation: <100>
Resistivity: 0.003-0.005 Ohm-cm
Thickness: 525 +/- 25um
Front Side: Polished
Back Side: Etched
Film: 1000A +/- 5% Wet Thermal Oxide
**1 Lot = 25 wafers


All Sales are Final.  RVM Terms and Conditions Apply
Shipping PP&A.  Lead time 1 week

2 in stock

SKU: PRD1000 Categories: ,

Description

This product consist of 100mm silicon wafers with 1,000A of Wet thermal Oxide.

Wet thermal oxide on Low Resistivity Silicon has been a long time favorite for many customers.  Our ultra-pure Wet Thermal Oxidation process is designed to ensure that you receive premium quality films that provide the consistency and repeatability needed make your project a success.  All orders are sent with a Certificate of Conformance containing wafer specifications and Thermal Oxide film thickness data.

  Wet Thermal Oxidation Parameters

Thickness 950Å – 1,050Å
Thickness Tolerance 1,000Å +/-5%
Sides Pressed Both
Refractive Index 1.456 +/-0.02 @ 632.8nm
Film Stress -320MPa +/-50MPa (Compressive)
Wafer Thickness Std. Thickness
Wafer Material Silicon
Temperature 900C° – 1050C°
Gasses Oxygen
Equipment Horizontal Furnace

Additional information

Weight 3 oz
Dimensions 10 × 10 × 8 in
Diameter

Type/Dopant

Orientation

Resistivity

Surface

Film