150mm Silicon Wafers 40,000A Wet Thermal Oxide

$1,225.00

Substrate: Silicon Wafers
Diameter: 150mm
Type/Dopant: P/Boron
Orientation: <100>
Resistivity: 1-20 Ohm-cm
Thickness: 675 +/- 25um
Front Side: Polished
Back Side: Etched
Film: 40,000A +/- 5% Wet Thermal Oxide


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We have designed our Wet Thermal Oxidation process to ensure that you receive the highest quality films.  This product consists of medium resistivity 150mm silicon wafers coated with 4um of our ultra-pure Wet thermal Oxide. All orders are sent with a Certificate of Conformance containing wafer specifications and Thermal Oxide film thickness data.

  Wet Thermal Oxidation Parameters

Thickness3,8000Å – 42,000Å
Thickness Tolerance40,000Å +/-5%
Sides PressedBoth
Refractive Index1.456 +/-0.02 @ 632.8nm
Film Stress-320MPa +/-50MPa (Compressive)
Wafer ThicknessStd. Thickness
Wafer MaterialSilicon
Temperature900C° – 1050C°
GassesOxygen
EquipmentHorizontal Furnace