1,000A Wet Thermal Oxide on 150mm Silicon Wafers (PRD1505)

$975.00

Substrate: Silicon Wafers
Diameter: 150mm
Type/Dopant: P/Boron
Orientation: <100>
Resistivity: 1 – 20 Ohm-cm
Thickness: 675+/- 25um
Front Side: Polished
Back Side: Etched
Film: 1000A +/- 5% Wet Thermal Oxide
**1 Lot = 25 wafers


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This product consist of 150mm silicon wafers with 1,000A of Wet thermal Oxide. Wet thermal Oxide on Low Resistivity Silicon has been a long time favorite for many customers.  Our ultra-pure Wet Thermal Oxidation process is designed to ensure that you receive premium quality films that provide the consistency and repeatability needed make your project a success.  All orders are sent with a Certificate of Conformance containing wafer specifications and Thermal Oxide film thickness data.

  Wet Thermal Oxidation Parameters

Thickness 950Å – 1,050Å
Thickness Tolerance 1,000Å +/-5%
Sides Pressed Both
Refractive Index 1.456 +/-0.02 @ 632.8nm
Film Stress -320MPa +/-50MPa (Compressive)
Wafer Thickness Std. Thickness
Wafer Material Silicon
Temperature 900C° – 1050C°
Gasses Oxygen
Equipment Horizontal Furnace