This product consist of 150mm silicon wafers with 1,000A of Wet Thermal Oxide. Wet Thermal Oxide on Low Resistivity Silicon has been a long time favorite for many customers. Our ultra-pure Wet Thermal Oxidation process is designed to ensure that you receive premium quality films that provide the consistency and repeatability needed make your project a success. All orders are sent with a Certificate of Conformance containing wafer specifications and Thermal Oxide film thickness data.
150mm Silicon Wafers 1,000A Wet Thermal Oxidation Parameters |
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Thickness | 950Å – 1,050Å |
Thickness Tolerance | 1,000Å +/-5% |
Sides Pressed | Both |
Refractive Index | 1.456 +/-0.02 @ 632.8nm |
Film Stress | -320MPa +/-50MPa (Compressive) |
Wafer Thickness | Std. Thickness |
Wafer Material | Silicon |
Temperature | 900C° – 1050C° |
Gasses | Oxygen |
Equipment | Horizontal Furnace |