This product consist of 150mm silicon wafers with 1,000A of Wet thermal Oxide. Wet thermal Oxide on Low Resistivity Silicon has been a long time favorite for many customers. Our ultra-pure Wet Thermal Oxidation process is designed to ensure that you receive premium quality films that provide the consistency and repeatability needed make your project a success. All orders are sent with a Certificate of Conformance containing wafer specifications and Thermal Oxide film thickness data.
Wet Thermal Oxidation Parameters |
|
| Thickness | 950Å – 1,050Å |
| Thickness Tolerance | 1,000Å +/-5% |
| Sides Pressed | Both |
| Refractive Index | 1.456 +/-0.02 @ 632.8nm |
| Film Stress | -320MPa +/-50MPa (Compressive) |
| Wafer Thickness | Std. Thickness |
| Wafer Material | Silicon |
| Temperature | 900C° – 1050C° |
| Gasses | Oxygen |
| Equipment | Horizontal Furnace |
