Rogue Valley Microdevices engineer carrying a wafer lot box through the MEMS foundry
MEMS Foundry → Metal Lift-Off

Metal Lift-Off Process Services with a Specialized Bilayer Resist

Rogue Valley Microdevices provides metal lift-off process services for MEMS and semiconductor device fabrication. We are experts in depositing thick metal layers, and we developed a specialized bilayer resist process that improves film adhesion and delivers clean, high-quality lift-off.

Lift-off processing operates as part of our integrated U.S.-based MEMS foundry platform, where our engineers combine photolithography, thin-film deposition, and wafer processing expertise to support complex device development and manufacturing.

What Is the Metal Lift-Off Process?

The lift-off process patterns metal films by first forming a patterned photoresist layer on the wafer, then depositing metal across the entire surface. When the resist dissolves during the lift-off step, it carries away the metal sitting on top of the resist, leaving metal only in the desired patterned regions.

Because the process adds material only where needed, lift-off often works better than etching for metals that resist chemical etchants, such as platinum, or when a subtractive process would damage underlying layers.

Key advantages include:

  • Clean pattern definition without metal etching
  • Compatibility with sensitive materials and multilayer structures
  • Precise pattern control for MEMS and semiconductor devices
  • Reliable wafer-level repeatability

Our Bilayer Resist Lift-Off Process

Our MEMS foundry uses a specialized bilayer resist lift-off process that improves metal adhesion and enables clean removal of unwanted films. The dual-layer photoresist stack creates a controlled re-entrant (undercut) profile that physically breaks the continuity of the deposited metal film at the resist sidewalls. Because the metal never bridges across the sidewall, the lift-off solvent reaches and dissolves the release layer cleanly, instead of tearing metal away from patterned features.

What that means for your device:

Smooth Metal EdgesNo burrs, flags, or sidewall tearing along patterned geometries
Particle ControlReduced particle generation during the lift-off solvent bath
Reliable Pattern TransferConsistent thin-film patterning across the wafer, without electrical shorts or structural defects
Bilayer resist lift-off sequenceThree panels: bilayer resist patterned with an undercut, metal deposited with the film breaking at the undercut, and resist dissolved leaving a clean metal feature.1 · Pattern bilayer resist2 · Deposit metal3 · Dissolve resistUndercut profileSiliconFilm breaks at the undercutExcess metal lifts awayClean metal feature remains
Why the bilayer matters. The undercut breaks the metal film at the resist sidewall, so solvent reaches the release layer and unwanted metal lifts away without tearing the patterned feature.

This process control helps engineers integrate metal layers into complex MEMS device structures without introducing defects or unwanted electrical connections.

Metals Commonly Patterned with Lift-Off

Our lift-off processing supports a wide range of PVD-deposited metals used in MEMS devices, sensors, and semiconductor components, including:

  • Aluminum
  • Chrome
  • Copper
  • Gold
  • Indium
  • Nickel
  • Platinum
  • Silver
  • Tin
  • Titanium

These materials enable electrical interconnects, electrodes, bonding pads, reflective layers, and functional device structures.

Supported Substrates and Wafer Sizes

We run metal lift-off on 100mm, 150mm, and 200mm wafers. Lithography-based patterning sets the 100mm minimum for lift-off; if your early-stage work uses smaller substrates, our film-only wafer services support wafers down to 50mm. Supported substrate materials include:

ParameterCapability
Wafer sizes100mm, 150mm, and 200mm
Substrate materialsSilicon; silicon on insulator (SOI); quartz; sapphire; glass; GaN on silicon; silicon carbide; other specialty substrates

Applications in MEMS and Sensor Devices

Metal lift-off plays an important role in many MEMS fabrication flows, creating the patterned conductive layers that define electrical and functional device elements. Common applications include:

  • MEMS sensor electrodes
  • RF MEMS interconnects
  • Optical MEMS reflective coatings
  • Microheater and microelectrode structures
  • Contact pads and bonding interfaces
  • Thin-film metallization layers

Our wafer-level processing ensures consistent results across development runs and production manufacturing.

Lift-Off or Metal Etch?

Lift-off adds metal only where the pattern needs it; etching removes metal everywhere the mask leaves it exposed. When your metal stack is compatible with wet etching or dry etching, a subtractive process may be the simpler route. Our metal lift-off vs. metal etch guide compares the two approaches, and our engineers will help you pick the right one for your device.

Request a Quote for Metal Lift-Off Services

Tell us your metal stack, substrate, and pattern requirements, and our engineering team will scope a lift-off process that fits your device. Request a quote to get started.

Request a Quote